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Optical Properties of Amorphous Carbon Thin Films Fabricated Using a High-Energy-Impulse Magnetron-Sputtering
Lukasz Skowronski1, Rafal Chodun2, Marek Trzcinski1
1Division of Surface Science, Faculty of Chemical Technology and Engineering, Bydgoszcz University of Science and Technology, Kaliskiego 7, 85-796 Bydgoszcz, Poland.
Abstract:
This paper reports the results of amorphous carbon thin films fabricated by using the gas-impulse-injection magnetron-sputtering method and differing the accelerating voltage (1.0-1.4 kV). The obtained layers were investigated using Raman spectroscopy, X-ray photoelectron spectroscopy (XRD), and spectroscopic ellipsometry (SE). The analysis of the Raman and XPS spectra point to the significant content of sp3 hybridization in the synthesized materials (above 54-73%). The refractive index of the films is very high-above 2.45 in the infrared spectral range. The band-gap energy (determined using the inversed-logarithmic-derivative method) depends on the discharging voltage and is in the range from 1.58 eV (785 nm) to 2.45 eV (506 nm). Based on the obtained results, we have elaborated a model explaining the a-C layers' formation process.
