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A 3.06 μm Single-Photon Avalanche Diode Pixel with Embedded Metal Contact and Power Grid on Deep Trench Pixel
Jun Ogi1, Fumiaki Sano1, Tatsuya Nakata1
1Sony Semiconductor Solutions Corporation, Atsugi-shi 243-0014, Japan.
Sensors (Basel, Switzerland)
|November 14, 2023
Summary
This study introduces a novel single-photon avalanche diode (SPAD) pixel design. It achieves low dark count rates and high photon detection efficiency for advanced imaging sensors.
Area of Science:
- Photonics and Semiconductor Devices
- Image Sensor Technology
- Integrated Circuit Design
Background:
- Single-photon avalanche diodes (SPADs) are crucial for low-light imaging.
- Scaling SPAD arrays to high resolutions presents challenges in performance and power consumption.
- Edge breakdown and dark current are key limitations in SPAD pixel design.
Purpose of the Study:
- To present a novel 3.06 μm pitch SPAD pixel design.
- To improve dark count rate (DCR) and photon detection efficiency (PDE).
- To enable high-resolution photon-counting image sensors through array integration.
Main Methods:
- Implementation of an embedded metal contact and power grid within a two-step deep trench isolation.
- Optimization of the SPAD pixel's potential design for edge breakdown suppression.
- Integration of polysilicon resistors for reduced voltage drop and power consumption.
Main Results:
- Achieved a low dark count rate of 15.8 counts per second (cps).
- Demonstrated a high photon detection efficiency of 57%.
- Obtained a low crosstalk probability of 0.4% due to the embedded metal optical shield.
Conclusions:
- The presented SPAD pixel design effectively suppresses edge breakdown and reduces dark counts.
- The integrated features enhance optical shielding, reduce crosstalk, and improve PDE.
- This design is suitable for large arrays in high-resolution photon-counting image sensors, optimizing power delivery and consumption.

