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Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons

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Forty-Nanometer Plasmonic Lithography Resolution with Two-Stage Bowtie Lens.

Yan Meng^1,2, Ruiguang Peng³, Jie Cheng¹

¹School of Mechanical and Electronic Engineering, China University of Mining and Technology, Beijing 100083, China.

|November 25, 2023

Summary

Researchers developed a novel two-stage optical resolution technique using surface plasmons to overcome light diffraction limits. This method compresses optical energy for advanced nanoscale fabrication and semiconductor manufacturing.

Keywords:

bowtie aperture maskless nanolithography plasmonic lens

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Last Updated: Jul 10, 2025

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Trapping of Micro Particles in Nanoplasmonic Optical Lattice

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Published on: September 5, 2017

Area of Science:

Optics and Photonics
Nanotechnology
Materials Science

Background:

Optical imaging and photolithography are crucial for nano-electronics, metrology, and single-molecule biology.
Light diffraction limits optical resolution, hindering nanoscale fabrication.
Surface plasmons offer a way to bypass the diffraction limit due to their wavelengths.

Purpose of the Study:

To design a novel two-stage resolution technique to overcome optical diffraction limitations.
To compress optical energy to profound sub-wavelength dimensions.
To enhance nanoscale fabrication and semiconductor manufacturing capabilities.

Main Methods:

Utilized a combination of propagating surface plasmons (PSPs) and localized surface plasmons (LSPs).
Designed a pioneering two-staged resolution system.
Integrated the plasmonic lens with parallel patterning technology.

Main Results:

Achieved significant compression of optical energy at sub-wavelength dimensions.
Demonstrated a method to overcome the fundamental diffraction limit of optical resolution.
Developed an economic framework for improved photolithography throughput.

Conclusions:

The developed plasmonic lens technology offers a pathway to next-generation semiconductor fabrication.
This approach enhances throughput capabilities in photolithography.
Enables advanced applications in nano-electronics and single-molecule biology by overcoming resolution barriers.