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Local Structural Modifications in Metallic Micropillars Induced by Plasma Focused Ion Beam Processing.

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Surface Science

Background:

  • Focused Ion Beam Scanning Electron Microscopes (FIB-SEM) are crucial for micro/nanoscale imaging and fabrication.
  • Ion-sample interactions in FIB-SEM can cause artefacts like ion implantation and material redeposition.
  • Plasma Focus Ion Beam (PFIB) milling is a technique used for preparing samples.

Purpose of the Study:

  • To analyze lattice distortion and ion implantation in metallic micropillars prepared by PFIB milling.
  • To investigate the effect of ion energy on ion implantation and redeposition.
  • To quantify the induced strain fields in the milled material.

Main Methods:

  • Preparation of metallic micropillars using PFIB milling with Xe+ ions at 10 keV and 30 keV.
  • Non-destructive synchrotron techniques, including X-ray fluorescence (XRF) and X-ray nanodiffraction.
  • Analysis of lattice distortion, ion implantation density, and strain fields.

Main Results:

  • Higher Xe+ ion energy (30 keV vs 10 keV) resulted in a higher density of implanted ions in the redeposited and milled material.
  • Ion mixing within the redeposited material significantly influenced the lattice structure, causing deformation.
  • X-ray nanodiffraction revealed strain fields with up to 0.2% lattice distortion along the ion bombardment direction.

Conclusions:

  • PFIB milling parameters, specifically ion energy, critically affect ion implantation and material redeposition.
  • Understanding and quantifying ion-induced artefacts is essential for accurate nanoscale material characterization and fabrication.
  • Synchrotron-based X-ray techniques provide valuable insights into microstructural changes caused by ion beam processing.