Mechanism and performance evaluation of transient and selective laser processing of glass based on optical monitoring

Femtosecond laser processing has been widely applied in glass processing owing to its ability to fabricate microscale components. To improve processing efficiency, a transient and selective laser (TSL) processing technique was previously developed, in which electron excitation was induced inside a transparent medium by a single pulse of femtosecond (fs) laser, and a single pulse of microsecond (µs) laser can be selectively absorbed in this excited region to heat and remove the material. However, because of its high speed removal process, the unclear mechanism and inefficient evaluation of its processing performance limit its further application. This study analyzes the transient spatiotemporal evolution of the induced plasma and the related material removal mechanism of the TSL processing using a side high-speed monitoring method. To achieve a rapid performance evaluation, a quantitative analysis of the optical plasma signals (on a microsecond timescale) generated in TSL processing was performed by employing a developed coaxial high-speed monitoring method using a photodetector. The variations in the shapes, intensity distribution, and dimensions of the plasma were quantitatively investigated. In addition, the relation between the plasma signal and drilling performance under different laser parameters, including hole depth, hole types, and cracks, was explored and quantitatively analyzed. The revealed mechanism is expected to contribute to the broadening of the application of TSL processing in microfabrication. Furthermore, the developed high-speed and precision monitoring technology can be utilized for high-speed evaluation and precision control of machining quality in real time during ultrahigh-speed laser machining, without time-consuming camera observations.