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High-Resolution Afterglow Patterning Using Cooperative Vapo- and Photo-Stimulation
Kikuya Hayashi1, Shuzo Hirata1
1Department of Engineering Science, The University of Electro-Communications, 1-5-1 Chofugaoka, Chofu, Tokyo, 182-8585, Japan.
Small (Weinheim an Der Bergstrasse, Germany)
|November 29, 2023
Summary
Researchers developed rapid, high-resolution afterglow patterning for crystalline materials using combined vapor and light stimulation. This technique enhances anti-counterfeiting applications by creating stable, readable afterglow images on crystalline films.
Area of Science:
- Materials Science
- Photochemistry
- Organic Chemistry
Background:
- Bright afterglow room-temperature phosphorescence (RTP) is crucial for advanced anti-counterfeiting.
- Developing rapid, high-resolution patterning methods for crystalline materials is essential for improved fabrication and readout stability.
- Existing methods often struggle with speed and resolution compared to amorphous materials.
Purpose of the Study:
- To report a novel method for high-resolution afterglow patterning of crystalline materials.
- To investigate the mechanism of pattern formation using cooperative organic vapor and photo-stimulation.
- To demonstrate the potential for rapid fabrication and stable readout of afterglow patterns for anti-counterfeiting.
Main Methods:
- Utilized a single crystal of (S)-(-)-2,2'-bis(diphenylphosphino)-5,5',6,6',7,7'8,8'-octahydro-1,1'-binaphthyl [(S)-H8-BINAP] doped with (S)-(-)-2,2'-bis(diphenylphosphino)-1,1'-binaphthyl [(S)-BINAP] exhibiting green afterglow RTP.
- Applied weak continuous photoirradiation under dichloromethane (DCM) vapor to induce changes in the crystalline structure.
- Analyzed the transformation from crystalline to amorphous states and the role of photo-oxidation and vapor interaction in pattern formation.
Main Results:
- Achieved rapid, high-resolution afterglow patterning of crystalline films via cooperative organic vapor and photo-stimulation.
- Demonstrated that photoirradiation under DCM vapor induces oxidation of (S)-H8-BINAP, leading to crystal melting and formation of an amorphous, non-afterglow state.
- Confirmed that the formed afterglow images on the crystalline film can be repeatedly read out under ambient conditions without DCM vapor.
Conclusions:
- The developed method enables rapid and high-resolution afterglow patterning of crystalline materials.
- The process relies on a combination of photo-oxidation and organic vapor interaction to control the material's phosphorescence properties.
- This technique offers a promising pathway for developing advanced anti-counterfeiting technologies with enhanced stability and readability.
