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Published on: May 22, 2015
Sensitive Aluminum SPR Sensors Prepared by Thermal Evaporation Deposition
Chengchao He1, Yanhong Li1, Yuxiang Yang1
1School of Optoelectrical Engineering and Instrumentation Science, Dalian University of Technology, Dalian 116024, China.
Abstract:
We used straightforward thermal evaporation deposition to form thin Al films on fused silica slides as surface plasmon resonance (SPR) sensors in the blue visible region. Compared to other studies, we achieved high-quality Al SPR sensors with a low vacuum level at 7 × 10-4 Pa and a low deposition rate between 1.47 and 3.41 nm/s. These Al films have an atomic-level surface roughness. With our recipe, the requirements for deposition conditions are relaxed, and the operation time is reduced remarkably. The experimental sensitivity of the bulk refractive index measurements using 405 nm probing light is as high as 149.9°/RIU. Compared with other studies, our blue visible Al SPR completes the Al SPR working frequency range from deep UV to near-infrared which is much broader than the working range of Au SPR sensors. The cost of Al material is cheap, and the deposition instrument is also economic and operation easy. Considering the compatibility with most of the nanofabrication procedures and stability from the native oxide layer, Al SPR sensors have a huge potential to replace Au SPR sensors as the new golden standard of SPR sensing technology.

