Wetting state and mechanical property alteration for the Fe₃Si films using rapid thermal annealing under various...

The current research demonstrates the modification of the wetting behavior and mechanical features as well as structure and morphology of Fe₃Si films created via facing target sputtering by the rapid thermal annealing (RTA) with the set RTA temperatures (T_RTA) of 200, 400, 600, and 800 °C. Following the RTA process, the crystallinity of Fe₃Si developed under 400 °C or below. At the 600 °C and 800 °C T_RTA, new crystal orientations emerged for FeSi and then β-FeSi₂, respectively. Together with composition results, the Fe₃Si films were proven to change into FeSi and then FeSi₂ under a high T_RTA regime. At temperatures of 600 °C and 800 °C, large crystallites, including the scraggly interface, were observed. The root-mean-square roughness roughened slightly according to the RTA process at T_RTA of 600 °C or above. The hydrophobic properties of the Fe₃Si film surfaces became hydrophilic after the RTA procedure at a T_RTA value above 400 °C. The hardness value of the Fe₃Si films evidently increased through RTA at 600 °C and 800 °C. Thus, above 400 °C, the RTA process significantly alters the physical features of as-created Fe₃Si films.