Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

UV–Vis Spectrometers01:14

UV–Vis Spectrometers

1.3K
The absorbance of UV and visible (UV–visible) radiations is measured using a UV–visible spectrophotometer. Deuterium lamps, which emit UV radiation, and tungsten lamps, which produce radiation in the visible region, are used as light sources in UV–visible spectrophotometers. A monochromator or prism is used for diffraction grating, i.e., to split the incoming radiation into different wavelengths. A system of slits is used to focus the desired wavelength on the sample cell.
1.3K

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Femtosecond modulation of electron correlations in a Luttinger liquid.

Science advances·2026
Same author

Non-equilibrium states and interactions in the topological insulator and topological crystalline insulator phases of NaCd<sub>4</sub>As<sub>3</sub>.

Structural dynamics (Melville, N.Y.)·2025
Same author

Correction to "Bipolaronic Nature of the Pseudogap in Quasi-One-Dimensional (TaSe<sub>4</sub>)<sub>2</sub>I Revealed via Weak Photoexcitation".

Nano letters·2024
Same author

Erratum: "A beamline for ultrafast extreme ultraviolet magneto-optical spectroscopy in reflection near the shot noise limit" [Rev. Sci. Instrum. 94, 033001 (2023)].

The Review of scientific instruments·2024
Same author

Relativistic ultrafast electron diffraction at high repetition rates.

Structural dynamics (Melville, N.Y.)·2023
Same author

A beamline for ultrafast extreme ultraviolet magneto-optical spectroscopy in reflection near the shot noise limit.

The Review of scientific instruments·2023

Related Experiment Video

Updated: Jul 8, 2025

Measurement of Scattering Nonlinearities from a Single Plasmonic Nanoparticle
15:06

Measurement of Scattering Nonlinearities from a Single Plasmonic Nanoparticle

Published on: January 3, 2016

12.9K

Tabletop extreme ultraviolet reflectometer for quantitative nanoscale reflectometry, scatterometry, and imaging.

Yuka Esashi1, Nicholas W Jenkins1, Yunzhe Shao1

  • 1Department of Physics, JILA, and STROBE NSF Science and Technology Center, University of Colorado Boulder and NIST, Boulder, Colorado 80309, USA.

The Review of Scientific Instruments
|December 18, 2023
PubMed
Summary

A new extreme-ultraviolet (EUV) imaging reflectometer offers high-precision, non-destructive metrology for nanostructures. This advanced tool quantitatively measures geometry and composition, crucial for semiconductor and materials science applications.

More Related Videos

Resonance Raman Spectroscopy of Extreme Nanowires and Other 1D Systems
07:44

Resonance Raman Spectroscopy of Extreme Nanowires and Other 1D Systems

Published on: April 28, 2016

15.1K
UV-Vis Spectroscopic Characterization of Nanomaterials in Aqueous Media
05:16

UV-Vis Spectroscopic Characterization of Nanomaterials in Aqueous Media

Published on: October 25, 2021

9.7K

Related Experiment Videos

Last Updated: Jul 8, 2025

Measurement of Scattering Nonlinearities from a Single Plasmonic Nanoparticle
15:06

Measurement of Scattering Nonlinearities from a Single Plasmonic Nanoparticle

Published on: January 3, 2016

12.9K
Resonance Raman Spectroscopy of Extreme Nanowires and Other 1D Systems
07:44

Resonance Raman Spectroscopy of Extreme Nanowires and Other 1D Systems

Published on: April 28, 2016

15.1K
UV-Vis Spectroscopic Characterization of Nanomaterials in Aqueous Media
05:16

UV-Vis Spectroscopic Characterization of Nanomaterials in Aqueous Media

Published on: October 25, 2021

9.7K

Area of Science:

  • Optics and Photonics
  • Materials Science
  • Nanotechnology

Background:

  • Coherent extreme-ultraviolet (EUV) light enables high-resolution, element-specific imaging of nanostructures.
  • Advanced metrology is essential for characterizing complex nanoscale materials and devices.

Purpose of the Study:

  • To present a multi-modal tabletop EUV imaging reflectometer for high-fidelity nanostructure metrology.
  • To demonstrate quantitative, non-destructive measurement of nanostructure geometry and composition.

Main Methods:

  • Utilizing a tabletop EUV imaging reflectometer with three distinct measurement modes: intensity reflectometry, scatterometry, and imaging reflectometry.
  • Probing nanostructures with high spatial resolution and elemental specificity.

Main Results:

  • Quantitative and non-destructive measurement of nanostructure geometry and composition with sub-nanometer precision.
  • Determination of parameters including surface/line edge roughness, density, linewidth, profile, and depth-resolved composition.
  • Demonstrated capability over a field of view of tens of square microns.

Conclusions:

  • The developed EUV reflectometer provides a powerful tool for advanced nanostructure characterization.
  • The system's multi-modal approach addresses diverse metrology challenges in semiconductor and materials science.
  • EUV metrology is highly applicable to a broad spectrum of scientific and industrial challenges.