Roll-to-plate 0.1-second shear-rolling process at elevated temperature for highly aligned nanopatterns.

Area of Science:

• Materials Science
• Nanotechnology
• Polymer Science

Background:

• Directed self-assembly is crucial for fabricating nanoscale patterns.
• Block copolymer (BCP) lithography offers high resolution but faces challenges in large-area, cost-effective production.
• Existing methods often struggle with achieving high orientation and preventing film defects.

Purpose of the Study:

• To develop a high-temperature, rapid shear-rolling process for directed self-assembly of block copolymers.
• To achieve high-orientation sub-10 nm line-space patterns over large areas.
• To demonstrate the applicability of the process for roll-to-roll manufacturing.

Main Methods:

• Utilized a high-temperature (280°C) and rapid (~0.1 s) shear-rolling process.
• Minimized polydimethylsiloxane (PDMS) pad adhesion, normal forces, and shear strain to prevent film delamination.
• Applied the process to various high-χ block copolymers and surface neutralization techniques.

Main Results:

• Achieved a high degree of orientation in a single shear-rolling step.
• Successfully fabricated unidirectional block copolymer patterns with a half-pitch as small as 8 nm.
• Demonstrated the process on 3-inch wide polyimide flexible films, confirming its suitability for continuous, large-area processing.

Conclusions:

• The developed shear-rolling process is a cost-effective and straightforward method for producing high-quality nanoscale block copolymer patterns.
• The technique effectively prevents film delamination at elevated temperatures, enabling high chain mobility and orientation.
• This method holds significant potential for scalable, roll-to-roll manufacturing of advanced nanostructures.