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Updated: Jul 7, 2025

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
This study introduces a novel center-non-zero (CNZ) depletion laser method for nanofabrication, significantly improving resolution. The new approach achieves a minimum linewidth of 30 nm, overcoming limitations of previous photoinhibition techniques.
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