Study of Modified Offset Trajectory for Bonnet Polishing Based on Lifting Bonnet Method.

Area of Science:

• Manufacturing Engineering
• Materials Science
• Surface Metrology

Background:

• Edge profile accuracy and surface quality are critical in workpiece polishing.
• Inability to converge at workpiece edges leads to defects.
• Existing polishing trajectories often fail to maintain edge integrity.

Purpose of the Study:

• To present a novel bias trajectory generation method for maintaining polished edge morphology.
• To improve edge profile accuracy and surface quality during polishing.
• To address the limitations of traditional polishing trajectories at workpiece edges.

Main Methods:

• Developed a bias trajectory generation method based on the lifting bonnet principle.
• Established polishing parameters and decreasing rules aligned with the lifting bonnet method.
• Utilized cubic Bessel curves for fitting edge trajectories and obtaining modified bias trajectory correction coefficients.

Main Results:

• The modified bias trajectory reduced edge collapse to 1.30 μm.
• Traditional grating trajectories resulted in 98.67 μm of edge collapse.
• The modified method demonstrated a 75.9-fold reduction in edge collapse compared to traditional methods.

Conclusions:

• The modified bias trajectory method effectively maintains workpiece edge morphology.
• This approach promotes the convergence of edge effects, enhancing overall surface quality.
• The developed method offers a significant improvement over traditional polishing techniques for edge finishing.