Subtractive Patterning of Nanoscale Thin Films Using Acid-Based Electrohydrodynamic-Jet Printing

Area of Science:

• Materials Science
• Nanotechnology
• Additive Manufacturing

Background:

• Traditional photolithography faces limitations in patterning customizable devices.
• Existing high-resolution printing for nanomaterials is predominantly additive.
• A need exists for subtractive patterning processes to complement additive methods.

Purpose of the Study:

• To introduce a novel subtractive patterning approach using electrohydrodynamic-jet (e-jet) printing.
• To demonstrate the etching of nanoscale zinc oxide (ZnO) thin films with acid-based inks.
• To explore the tunability of feature dimensions and ink properties for precise material removal.

Main Methods:

• Utilized atomic layer deposition (ALD) to deposit ZnO thin films.
• Employed electrohydrodynamic-jet (e-jet) printing with acid-based inks for subtractive patterning.
• Investigated the effect of printing parameters and ink composition on etching resolution and dynamics.

Main Results:

• Achieved nanoscale precision in subtractive patterning with a minimum linewidth of 11 µm.
• Demonstrated tunable channel depth with approximately 5 nm resolution.
• Showcased adjustable ink volatility and viscosity for controlled dissolution dynamics.

Conclusions:

• Developed a new acid-based subtractive patterning method using e-jet printing.
• This technique offers nanoscale precision for etching functional nanomaterials like ZnO.
• Potential applications include rapid prototyping and customizable manufacturing of advanced devices.