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Updated: Jul 6, 2025

Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization
Published on: July 12, 2016
Point field emission electron source with a magnetically focused electron beam
Paweł Urbański1, Piotr Szyszka1, Marcin Białas1
1Faculty of Electronics, Photonics and Microsystems, Wrocław University of Science and Technology, 11/17 Janiszewski St., 50-372 Wrocław, Poland.
Abstract:
This paper presents a field emitter in the form of a silicon tip covered with a layer of carbon nanotubes. The emitted beam is focused with a set of two electrostatic lenses and - which is novelty in such structures - with a magnetic field. The presented approach gave very promising results. The field emitter was able to provide a high emission current (about 50 µA) and a beam with a small and homogeneous spot. Such electron sources are necessary components of many miniature MEMS and nanoelectronics devices. The presented source is dedicated especially for the use in currently developed MEMS X-ray sources and MEMS electron microscopes.
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