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Are topological insulators promising thermoelectrics?
Michael Y Toriyama1, G Jeffrey Snyder1
1Department of Materials Science and Engineering, Northwestern University, Evanston, IL 60208, USA. MichaelToriyama2024@u.northwestern.edu.
Topological insulators (TIs) show promise for thermoelectric (TE) applications. Band inversion-driven warping in TIs enhances TE performance by reducing mass and increasing valley degeneracy, making them strong candidates for TE devices.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Solid State Physics
Background:
- Topological insulators (TIs) possess unique electronic properties due to their surface states.
- Existing research often focuses on TI surface states for thermoelectric (TE) applications, overlooking bulk properties.
- Current operating conditions for TE devices differ significantly from those where TI surface states are most effective.
Purpose of the Study:
- To investigate the role of bulk band structure in the thermoelectric performance of topological insulators (TIs).
- To determine if TIs can outperform normal insulators as thermoelectric materials under relevant conditions.
- To identify key properties of TIs that enhance thermoelectric efficiency.
Main Methods:
- High-throughput transport calculations using density functional theory (DFT).
- Development of theoretical models based on Boltzmann transport theory.
- Analysis of band structure properties, specifically band inversion and warping.
Main Results:
- Optimized TIs generally outperform normal insulators within the same structural class.
- Thermoelectric performance correlates positively with the strength of band inversion.
- Band inversion-driven warping is identified as the mechanism enhancing TE performance by reducing transport mass and increasing valley degeneracy.
Conclusions:
- Band inversion strength is a critical factor for the thermoelectric performance of TIs.
- Warping, a consequence of band inversion, significantly boosts TE efficiency.
- Alloying and strain engineering are proposed as strategies to tune band inversion and improve TE performance in TIs, positioning them as viable candidates for TE applications.
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