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Programmable Ferroelectricity in Hf0.5Zr0.5O2 Enabled by Oxygen Defect Engineering.

Minghao Shao1, Houfang Liu1, Ri He2

  • 1Institute of Microelectronics and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing 100084, China.

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|January 22, 2024
PubMed
Summary

This study demonstrates electrically controllable ferroelectricity in hafnia-based heterostructures using a novel electrode. This allows for multilevel polarization states, advancing ferroelectric electronics and memory applications.

Keywords:
ferroelectric HZOin situ characterizationmultilevel polarization statesoxygen defect

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Area of Science:

  • Materials Science
  • Solid State Physics
  • Nanotechnology

Background:

  • Ferroelectricity in hafnia-based materials is crucial for Si-compatible electronics.
  • Distinguishing intrinsic ferroelectric polarization from polar phases and oxygen vacancies is a significant challenge.

Purpose of the Study:

  • To demonstrate electrically controllable ferroelectricity in a Hf0.5Zr0.5O2 heterostructure.
  • To utilize a mixed ionic-electronic conductor electrode for manipulating ferroelectric properties.
  • To achieve multilevel polarization states for advanced electronic applications.

Main Methods:

  • Fabrication of a Hf0.5Zr0.5O2 heterostructure with Sr-doped LaMnO3 electrode.
  • In situ macroscopic characterization and atomic imaging of oxygen vacancy dynamics.
  • Electrical modulation of ferroelectric polarization states.

Main Results:

  • Achieved electrically reversible oxygen vacancy extraction and insertion in Hf0.5Zr0.5O2.
  • Demonstrated multilevel polarization states controlled by electric fields.
  • Confirmed the role of the mixed conductor in enabling advanced ferroelectric functionality.

Conclusions:

  • The mixed ionic-electronic conductor electrode facilitates the control and utilization of ferroelectric properties.
  • Programmed ferroelectric heterostructures with Si-compatible doped hafnia are promising for future electronic devices.
  • This work offers a pathway for developing next-generation ferroelectric memory and logic applications.