Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled...

Misty plasma processes based on colloidal solutions sprayed into low-pressure plasmas have recently shown great potential for multifunctional thin film deposition. In such processes, nanoparticle accumulation in ring-shaped structures remains the main obstacle to the synthesis of high-quality coatings containing abundant, small-scale, and evenly dispersed nanoparticles. These local buildups appear after a colloidal droplet evaporates from a substrate. Accordingly, controlling the droplets' size in the spray is of key importance to ensure a uniform nanoparticle content in the plasma-deposited nanocomposite film. In this work, it is shown that the use of more volatile solvents produces finer droplets on the substrate, thereby improving nanoparticle dispersion in the matrix. A one-dimensional evaporation model is further developed and used to show that, contrary to what one might expect, this result cannot be attributed to faster evaporation during droplet transport in the low-pressure plasma. Instead, a so-called "flash" boiling atomization mechanism is discussed to support the experimental findings.