Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Conference Report: INTERNATIONAL WORKSHOP ON SEMICONDUCTOR CHARACTERIZATION: PRESENT STATUS AND FUTURE NEEDS Gaithersburg, MD January 30 - February 2, 1995.

Journal of research of the National Institute of Standards and Technology·2017
Same author

Conference Reports: INTERNATIONAL CONFERENCE ON NARROW-GAP SEMICONDUCTORS AND RELATED MATERIALS Gaithersburg, MD June 12-15, 1989.

Journal of research of the National Institute of Standards and Technology·2017
Same author

Space-exposure effects on optical-baffle coatings at far-infrared wavelengths.

Applied optics·2010
Same author

Infrared properties of single crystal MgO, a substrate for high temperature superconducting films.

Applied optics·2010
Same author

Comparison of Fourier and laser spectroscopy in the far-infrared-submillimeter range.

Applied optics·2010
Same author

Far infrared transmission measurements with an optically pumped FIR laser.

Applied optics·2010
Same journal

Precise Numerical Differentiation of Thermodynamic Functions with Multicomplex Variables.

Journal of research of the National Institute of Standards and Technology·2024
Same journal

Characterization of 3-Dimensional Printing and Casting Materials for use in Computed Tomography and X-ray Imaging Phantoms.

Journal of research of the National Institute of Standards and Technology·2024
Same journal

On The Quotient of a Centralized and a Non-centralized Complex Gaussian Random Variable.

Journal of research of the National Institute of Standards and Technology·2024
Same journal

Fast Methods for Finding Multiple Effective Influencers in Real Networks.

Journal of research of the National Institute of Standards and Technology·2024
Same journal

Disinfection of Respirators with Ultraviolet Radiation.

Journal of research of the National Institute of Standards and Technology·2024
Same journal

DNA Origami Design: A How-To Tutorial.

Journal of research of the National Institute of Standards and Technology·2024
See all related articles

Related Experiment Video

Updated: Jul 4, 2025

Fabrication of Silica Ultra High Quality Factor Microresonators
07:51

Fabrication of Silica Ultra High Quality Factor Microresonators

Published on: July 2, 2012

16.4K

Optical Characterization in Microelectronics Manufacturing.

S Perkowitz1, D G Seiler1, W M Duncan2

  • 1National Institute of Standards and Technology, Gaithersburg, MD 20899-0001.

Journal of Research of the National Institute of Standards and Technology
|February 8, 2024
PubMed
Summary
This summary is machine-generated.

Optical characterization techniques are vital for semiconductor manufacturing, offering nondestructive analysis of material properties and device performance. These methods provide detailed insights crucial for developing advanced semiconductor materials and devices.

Keywords:
Raman scatteringellipsometryinfrared spectroscopymodulation spectroscopyoptical microscopyphotoluminescence

More Related Videos

Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station
05:57

Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station

Published on: April 1, 2020

8.0K
Spectral and Angle-Resolved Magneto-Optical Characterization of Photonic Nanostructures
08:01

Spectral and Angle-Resolved Magneto-Optical Characterization of Photonic Nanostructures

Published on: November 21, 2019

7.1K

Related Experiment Videos

Last Updated: Jul 4, 2025

Fabrication of Silica Ultra High Quality Factor Microresonators
07:51

Fabrication of Silica Ultra High Quality Factor Microresonators

Published on: July 2, 2012

16.4K
Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station
05:57

Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station

Published on: April 1, 2020

8.0K
Spectral and Angle-Resolved Magneto-Optical Characterization of Photonic Nanostructures
08:01

Spectral and Angle-Resolved Magneto-Optical Characterization of Photonic Nanostructures

Published on: November 21, 2019

7.1K

Area of Science:

  • Materials Science
  • Solid State Physics
  • Optoelectronics

Background:

  • Semiconductor device fabrication requires precise measurement of material and device parameters.
  • Characterization is essential for quality control, new material development, and understanding microstructures.
  • Optical characterization offers non-destructive, minimal sample preparation, and wafer-scale mapping capabilities.

Purpose of the Study:

  • To review key optical characterization techniques used in the semiconductor industry.
  • To highlight the advantages of optical methods over electrical and chemical approaches.
  • To demonstrate the application of these techniques for measuring diverse semiconductor properties.

Main Methods:

  • Ellipsometry
  • Infrared Spectroscopy
  • Microscopy
  • Modulation Spectroscopy
  • Photoluminescence
  • Raman Scattering

Main Results:

  • Optical techniques measure fundamental parameters like band structure, carrier scattering, impurities, defects, and layer thicknesses.
  • These methods are non-destructive, require minimal sample preparation, and enable 2D/3D property mapping.
  • The selected techniques cover a broad spectrum of electromagnetic radiation and measure various semiconductor properties.

Conclusions:

  • Optical characterization is indispensable for the semiconductor industry, supporting both research and production.
  • The discussed techniques provide comprehensive insights into semiconductor materials and device performance.
  • These non-destructive optical methods are crucial for advancing semiconductor technology.