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Differential phase contrast (DPC) mapping electric fields: Optimising experimental conditions.

Chen Li1, Xiaoke Mu1, Maxim Korytov2

  • 1Thermo Fisher Scientific, Eindhoven, the Netherlands.

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|February 14, 2024
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Summary
This summary is machine-generated.

Differential Phase Contrast (DPC) in Scanning Transmission Electron Microscopy (STEM) effectively maps electric fields in semiconductors. Optimization is key, with DPC proving reliable for fields above 0.5 mV/nm in thicker samples.

Keywords:
DPCSTEMdopingelectric fieldn-n junctionp-n junctionsemiconductor

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Area of Science:

  • Materials Science
  • Condensed Matter Physics
  • Electron Microscopy

Background:

  • Differential Phase Contrast (DPC) is a powerful technique for visualizing electric fields within semiconductor materials using Scanning Transmission Electron Microscopy (STEM).
  • Optimizing experimental parameters is crucial for accurate electric field mapping but remains a significant challenge.

Purpose of the Study:

  • To systematically evaluate and compare critical experimental parameters influencing DPC measurements in STEM.
  • To determine the detection limits and practical applicability of DPC for electric field mapping in semiconductors.

Main Methods:

  • Investigated DPC performance by varying convergence angle, camera length, acceleration voltage, sample configuration, and orientation.
  • Utilized a four-quadrant segmented detector and a silicon specimen with varying Arsenic (As) concentrations.
  • Correlated DPC measurements with estimated electric fields across different sample thicknesses.

Main Results:

  • DPC measurements demonstrated a near-linear relationship with electric fields down to approximately 0.5 mV/nm for a 145 nm thick sample.
  • The signal-to-noise ratio of DPC can be enhanced by increasing specimen thickness for planar junctions.
  • DPC's reliability decreases for electric fields below 0.5 mV/nm or in the presence of curved junctions.

Conclusions:

  • DPC with a segmented detector is a practical method for mapping electric fields above 0.5 mV/nm at planar junctions in semiconductors.
  • For weaker electric fields or curved junctions, alternative high-sensitivity techniques like 4D STEM with pixelated detectors are necessary.
  • This study provides essential guidance for selecting appropriate techniques for electric field characterization in diverse semiconductor devices.