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Programming Interfacial Porosity and Symmetry with Escherized Colloids.

Nathan A Mahynski¹, Vincent K Shen¹

¹Chemical Sciences Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States.

Journal of Chemical Theory and Computation

|February 22, 2024

Summary

This summary is machine-generated.

We developed a method to control colloidal film structure and symmetry using isohedral tiles. This approach enables the design of symmetric, manufacturable colloidal materials through precise surface patch engineering.

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Area of Science:

Materials Science
Crystallography
Colloid Science

Background:

Designing self-assembling colloidal films requires precise control over structure and symmetry.
Previous methods often overlooked the symmetry of the underlying motif or the tile itself.
Achieving symmetric colloidal assemblies is crucial for practical manufacturing.

Purpose of the Study:

To present a unified methodology for simultaneously designing porosity and plane symmetry in colloidal films.
To enable the creation of symmetric colloidal assemblies using a tile-based functionalization approach.
To provide computational tools for classifying tiles and optimizing their fit to motifs ('Escherization').

Main Methods:

Utilizing isohedral tiles to define the location and shape of enthalpically interacting surface patches on motifs.
Analyzing the combined symmetries of the tile and motif to determine the plane symmetry group of the assembly.
Developing computational tools for automatic tile classification and motif optimization.

Main Results:

A complete framework for designing both porosity and plane symmetry in self-assembling colloidal films.
Demonstration of how tile and motif symmetries dictate the final assembly's symmetry.
Successful application of the method to design symmetric colloids, enhancing manufacturability.

Conclusions:

This tile-based approach offers a comprehensive method for designing complex colloidal structures.
The developed computational tools facilitate the 'Escherization' process for symmetric colloid design.
This work advances the controlled fabrication of advanced materials with tailored symmetries.