Low-temperature dissociation of CO2 molecules on vicinal Cu surfaces
Takanori Koitaya1, Yuichiro Shiozawa2, Yuki Yoshikura2
1Department of Chemistry, Graduate School of Science, Kyoto University, Kitashirakawa-Oiwakecho, Sakyo-Ku, Kyoto 606-8502, Japan. koitaya.takanori.5j@kyoto-u.ac.jp.
Abstract:
The reaction of carbon dioxide on the vicinal Cu surfaces at low temperatures was investigated by infrared reflection absorption spectroscopy, scanning tunneling microscopy, X-ray photoelectron spectroscopy, and quadrupole mass spectrometry. Dissociation of CO2 molecules into CO on the Cu(997) and Cu(977) surfaces was observed at temperatures between 80 K and 90 K, whereas it did not occur on Cu(111) under a similar condition. CO and physisorbed CO2 were the main adsorbates during the reaction. In contrast, the amount of atomic oxygen on the surface was small. The dissociation of CO2 was promoted by the small amount of oxygen produced by the CO2 dissociation on the Cu surfaces. This leads to the induction period in the CO2 reaction; the initial reaction rate on the clean Cu surfaces was low, and the coadsorbed oxygen enhanced the dissociation reactivity of CO2. Mass analysis of desorption species during the reaction revealed that the observed CO formation on the vicinal Cu surface is mainly caused by an oxygen-exchange reaction with residual CO in an ultra-high vacuum chamber.
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