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Bias dependence in statistical random telegraph noise analysis based on nanoscale CMOS ring oscillators
Semih Ramazanoglu1, Alicja Michalowska-Forsyth1, Bernd Deutschmann1
1Institute of Electronics (IFE), Graz University of Technology, Inffeldgasse 12/I, 8010 Graz, Austria.
Summary
Random Telegraph Noise (RTN) significantly impacts nanoscale complementary metal-oxide semiconductor (CMOS) devices. This study characterizes RTN in 40nm CMOS using ring oscillators, revealing its amplitude and frequency behavior across various supply voltages.
Area of Science:
- Semiconductor Device Physics
- Reliability Engineering
- Nanoscale Electronics
Background:
- Random Telegraph Noise (RTN) is a critical reliability issue in advanced nanoscale complementary metal-oxide semiconductor (CMOS) technologies.
- Understanding RTN is essential for ensuring the long-term performance and stability of integrated circuits.
Purpose of the Study:
- To characterize the temporal and spectral properties of RTN in 40nm CMOS technology.
- To statistically analyze RTN amplitude and frequency behavior under varying supply voltages.
- To extract capture and emission time constants of RTN.
Main Methods:
- Utilized Ring Oscillators (ROSCs) for RTN characterization.
- Employed arrays of 128 identical ROSC cells for comprehensive measurements.
- Conducted measurements across a supply voltage range of 0.5V to 0.7V.
Main Results:
- Identified dominant RTN amplitude (>0.37%) in 60% of cells at 0.65V supply.
- Characterized RTN amplitude strength and frequency behavior statistically.
- Extracted RTN capture and emission time constants ranging from 0.2μs to 10ms.
Conclusions:
- RTN is a prevalent phenomenon in 40nm CMOS technology, affecting a significant portion of devices.
- The study provides valuable statistical data on RTN characteristics, crucial for reliability modeling.
- The extracted time constants offer insights into the physical mechanisms underlying RTN in these devices.
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