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Light and matter co-confined multi-photon lithography.
Lingling Guan1, Chun Cao2,3, Xi Liu1
1Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China.
Nature Communications
|March 17, 2024
Summary
Mask-free multi-photon lithography now offers higher precision. A new light and matter co-confined technique overcomes resolution limits, achieving 30nm critical dimensions for advanced nanostructure fabrication.
Area of Science:
- Nanotechnology
- Materials Science
- Photonics
Background:
- Conventional lithography faces limitations in achieving ultra-high precision and lateral resolution.
- Multi-photon lithography (MPL) offers mask-free fabrication but is challenged by optical diffraction and proximity effects.
Purpose of the Study:
- To develop a novel strategy for overcoming resolution limitations in mask-free multi-photon lithography.
- To enhance the precision and lateral resolution of nanostructure fabrication using MPL.
Main Methods:
- Introduced light and matter co-confined multi-photon lithography (LMCC-MPL).
- Combined photo-inhibition and chemical quenchers to control radical distribution.
- Utilized mathematical modeling to understand the synergy between quenchers and photo-inhibition.
Main Results:
- Achieved a 30nm critical dimension.
- Obtained 100nm lateral resolution.
- Demonstrated a significant reduction in the gap compared to conventional lithography.
Conclusions:
- Light and matter co-confined multi-photon lithography effectively overcomes diffraction and proximity effects.
- The synergistic approach of quenchers and photo-inhibition leads to superior resolution.
- This technique enhances the accessibility and precision of arbitrary nanostructure fabrication.
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