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Updated: Jun 29, 2025

Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
Published on: October 23, 2018
Physical insight of random fluctuation in metal/IGZO Schottky barriers for low-variation contact optimal design
Lijun Xu1,2, Kun Luo1,2, Guohui Zhan1,2
1The Key Laboratory of Microelectronics Device and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China. wuzhenhua@ime.ac.cn.
Abstract:
The study aimed to investigate the impact of random fluctuations in Schottky barrier formation at polar interfaces between InGaZnO4 (IGZO) and different metals, particularly in the context of device miniaturization. The investigation revealed that different metals can establish various crystalline IGZO interfaces to achieve Ohmic contact, regardless of their work function. Additionally, the study suggests that introducing In doping at the amorphous IGZO interface can effectively reduce the Schottky barrier when in contact with Al metal. These findings provide theoretical guidance for the miniaturization of source-drain contacts in IGZO devices.
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