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Colloidal precipitates

Colloidal precipitates

The high insolubility of some precipitates can result in an unfavorable relative supersaturation. This can lead to colloidal particles with a large surface-to-mass ratio, where adsorption is promoted. For instance, in the precipitation of silver chloride, silver ions are adsorbed on the surface of the colloidal particles, forming a primary layer. This layer attracts ions of opposite charge (such as nitrate ions), forming a diffuse secondary layer of adsorbed ions. This electric double layer...

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Updated: Jun 29, 2025

A Technique to Functionalize and Self-assemble Macroscopic Nanoparticle-ligand Monolayer Films onto Template-free Substrates

A Technique to Functionalize and Self-assemble Macroscopic Nanoparticle-ligand Monolayer Films onto Template-free Substrates

Published on: May 9, 2014

Colloidal Atomic Layer Deposition on Nanocrystals Using Ligand-Modified Precursors.

Philippe B Green¹, Ona Segura Lecina¹, Petru P Albertini¹

¹Laboratory of Nanochemistry for Energy (LNCE), Institute of Chemical Sciences and Engineering (ISIC), École Polytechnique Fédérale de Lausanne, Sion CH-1950, Switzerland.

Journal of the American Chemical Society

|April 5, 2024

Summary

We developed a colloidal atomic layer deposition (ALD) method to coat nanocrystals with metal oxide shells. This technique preserves colloidal stability, enabling new applications in electronics and catalysis.

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Last Updated: Jun 29, 2025

A Technique to Functionalize and Self-assemble Macroscopic Nanoparticle-ligand Monolayer Films onto Template-free Substrates

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Published on: May 9, 2014

Ligand Nano-cluster Arrays in a Supported Lipid Bilayer

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Atomically Defined Templates for Epitaxial Growth of Complex Oxide Thin Films

Atomically Defined Templates for Epitaxial Growth of Complex Oxide Thin Films

Published on: December 4, 2014

Area of Science:

Materials Science
Nanotechnology
Chemical Engineering

Background:

Atomic layer deposition (ALD) enables precise thin film growth for electronics and catalysis.
Coating colloidally stable nanocrystals with ALD offers combined benefits of thin films and solution processing.
Existing ALD methods face challenges in precursor selection for maintaining nanocrystal colloidal stability.

Purpose of the Study:

To introduce a novel colloidal ALD method for coating nanocrystals with amorphous metal oxide shells.
To address the challenge of preserving colloidal stability during ALD of nanocrystals.
To develop a scalable and generalizable protocol for nanocrystal surface modification.

Main Methods:

Utilized metal-amide precursors with solubilizing groups and oleic acid as the oxygen source.
Employed a self-limiting, layer-by-layer growth mechanism characteristic of ALD.
Focused on precursors that simultaneously promote oxide growth and act as colloidal stabilizing ligands.

Main Results:

Successfully coated nanocrystals with amorphous metal oxide shells using the developed colloidal ALD.
Demonstrated that the chosen precursors maintain colloidal stability throughout the deposition process.
Achieved self-limiting, layer-by-layer oxide growth.

Conclusions:

The developed colloidal ALD method is a viable approach for coating nanocrystals with metal oxides.
The protocol is generalizable and scalable for potential industrial applications.
This technique opens avenues for advanced materials in displays, light detection, and catalysis.