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Related Concept Videos

Colloidal precipitates01:09

Colloidal precipitates

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The high insolubility of some precipitates can result in an unfavorable relative supersaturation. This can lead to colloidal particles with a large surface-to-mass ratio, where adsorption is promoted. For instance, in the precipitation of silver chloride, silver ions are adsorbed on the surface of the colloidal particles, forming a primary layer. This layer attracts ions of opposite charge (such as nitrate ions), forming a diffuse secondary layer of adsorbed ions. This electric double layer...
576

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Colloidal Atomic Layer Deposition on Nanocrystals Using Ligand-Modified Precursors.

Philippe B Green1, Ona Segura Lecina1, Petru P Albertini1

  • 1Laboratory of Nanochemistry for Energy (LNCE), Institute of Chemical Sciences and Engineering (ISIC), École Polytechnique Fédérale de Lausanne, Sion CH-1950, Switzerland.

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Summary

We developed a colloidal atomic layer deposition (ALD) method to coat nanocrystals with metal oxide shells. This technique preserves colloidal stability, enabling new applications in electronics and catalysis.

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Chemical Engineering

Background:

  • Atomic layer deposition (ALD) enables precise thin film growth for electronics and catalysis.
  • Coating colloidally stable nanocrystals with ALD offers combined benefits of thin films and solution processing.
  • Existing ALD methods face challenges in precursor selection for maintaining nanocrystal colloidal stability.

Purpose of the Study:

  • To introduce a novel colloidal ALD method for coating nanocrystals with amorphous metal oxide shells.
  • To address the challenge of preserving colloidal stability during ALD of nanocrystals.
  • To develop a scalable and generalizable protocol for nanocrystal surface modification.

Main Methods:

  • Utilized metal-amide precursors with solubilizing groups and oleic acid as the oxygen source.
  • Employed a self-limiting, layer-by-layer growth mechanism characteristic of ALD.
  • Focused on precursors that simultaneously promote oxide growth and act as colloidal stabilizing ligands.

Main Results:

  • Successfully coated nanocrystals with amorphous metal oxide shells using the developed colloidal ALD.
  • Demonstrated that the chosen precursors maintain colloidal stability throughout the deposition process.
  • Achieved self-limiting, layer-by-layer oxide growth.

Conclusions:

  • The developed colloidal ALD method is a viable approach for coating nanocrystals with metal oxides.
  • The protocol is generalizable and scalable for potential industrial applications.
  • This technique opens avenues for advanced materials in displays, light detection, and catalysis.