Microstructural and Textural Evolution of Cold-Drawn Mg-Gd Wires during Annealing Treatment

In addition to cold drawing, the process of annealing is also essential in the preparation of Mg-4.7 wt%Gd (G4.7) alloy wires. The effect of annealing treatment on the recrystallized microstructure and texture of cold-drawn G4.7 wires was investigated. The results demonstrate that the uniformity and regularity of the recrystallized grains, as well as the annealing texture, impact the follow-up cold drawing performance. When the as-drawn G4.7 wires were annealed at 375 °C, the recrystallized grains were refined, accompanied by uniformity and regularity. Accordingly, the G4.7 wire had a good subsequent drawing deformability, with a maximum accumulative true strain (ATS) of 144%. Additionally, the evolution of the microstructure was consistent with the evolution of the texture. While annealing at a lower temperature (325 °C), the {0002} basal texture of the G4.7 wire was weak, forming the main texture component <101¯0>//DD (the drawing direction). With the increase in temperature, the basal texture was gradually strengthened and the texture component transformed from <101¯0>//DD to a recrystallized texture based on <112¯0>//DD. Even under high-temperature annealing, the G4.7 wire was still affected by the cold-drawn deformation texture and could not fully recover to the as-extruded texture, thus causing a decrease in the subsequent drawing performance.