Defective UiO-66-NH₂ (Zr) for Simultaneous Adsorption of Phosphate and Pb²⁺ for Hydrogen Peroxide Purification

Removal of hetero ions from the hydrogen peroxide solution is a crucial step in purifying electronic-grade H₂O₂. Conventional adsorption materials are challenged to meet the need for the simultaneous adsorption of both anions and cations in solvents. UiO-66 (Zr) modified by acetic acid and amino group for simultaneous adsorption of phosphate and Pb²⁺ in H₂O₂ purification was fabricated in this work. The as-prepared defective UiO-66-NH₂ (Zr) demonstrated a significant increase in specific surface area and porosity, along with more exposed sites for phosphate and Pb²⁺ adsorption. The adsorption capacity of De-UiO-66-NH₂ for phosphate and Pb²⁺ in H₂O₂ solution was 52.28 mg g^-1 and 35.4 mg g^-1, which is 1.19 times and 1.88 times that of unmodified UiO-66 (Zr), respectively. The trace simultaneous adsorption with both 100 ppb phosphate and Pb²⁺ showed removal rates of 94.0% and 88.7%, respectively, confirming the practicality of MOF materials in the purification of electronic chemicals. This work highlights the potential of Zr-based MOFs as anionic and cationic simultaneous adsorbents for highly efficient purification of electronic-grade solvents.