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Updated: Jun 28, 2025

10:31
Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
Published on: November 24, 2016
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Correction: Efficiency improvement by using metal-insulator-semiconductor structure in InGaN/GaN micro-light-emitting
Jian Yin1, David Hwang2, Hossein Zamani Siboni2
1Department of Electrical and Computer Engineering, Waterloo Institute Nanotechnology, University of Waterloo, Waterloo, ON, N2L 3G1, Canada.
Frontiers of Optoelectronics
|April 12, 2024
Summary
No abstract available in PubMed .
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