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Microstructure of Deposits Sprayed by a High Power Torch with Flash Boiling Atomization of High-Concentration
Saeid Amrollahy Biouki1, Fadhel Ben Ettouil1, Andre C Liberati1
1Department of Mechanical, Industrial and Aerospace Engineering, Concordia University, Montreal, QC H3G 1M8, Canada.
Flash boiling atomization effectively injects high-concentration titanium oxide suspensions into plasma flows. Deposition efficiency and microstructure depend heavily on plasma power and solid concentration, with dense deposits achieved at high power.
Area of Science:
- Materials Science
- Plasma Physics
- Chemical Engineering
Background:
- Injecting high solid content suspensions into plasma flows is challenging.
- Titanium oxide (TiO2) is a key material for various applications.
- Optimizing deposition processes is crucial for material property control.
Purpose of the Study:
- To evaluate flash boiling atomization for injecting high solid content TiO2 suspensions.
- To investigate the impact of plasma power and solid concentration on deposition.
- To analyze the resulting microstructure and phase distribution (rutile/anatase) of deposits.
Main Methods:
- Preparation of water-based TiO2 suspensions with solid concentrations of 20-70 wt%.
- Injection of suspensions into plasma flows generated by 33-110 kW plasma torches.
- Analysis of deposited microstructures and phase composition using X-ray Diffraction (XRD).
Main Results:
- At low plasma power, deposition efficiency decreased with higher solid content, leading to unmelted particles at 70 wt%.
- At high plasma power, deposition efficiency increased with solid concentration, yielding dense deposits at 70 wt%.
- The anatase phase percentage ranged from 35.7% to 66.9%, influenced by power and concentration.
Conclusions:
- Flash boiling atomization is a viable method for high solid content suspension injection.
- Plasma power and solid concentration are critical parameters controlling deposition efficiency and microstructure.
- Controlled phase distribution of TiO2 (anatase/rutile) is achievable by adjusting process parameters.
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