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Related Concept Videos

Overview of Electron Microscopy01:25

Overview of Electron Microscopy

The wavelengths of visible light ultimately limit the maximum theoretical resolution of images created by light microscopes. Most light microscopes can only magnify 1000X, and a few can magnify up to 1500X. Electrons, like electromagnetic radiation, can behave like waves, but with wavelengths of 0.005 nm, they produce significantly greater resolution up to 0.05 nm as compared to 500 nm for visible light. An electron microscope (EM) can create a sharp image that is magnified up to 2,000,000X.
Scanning Electron Microscopy01:07

Scanning Electron Microscopy

A scanning electron microscope (SEM) is used to study the surface features of a sample by using an electron beam that scans the sample surface in a two-dimensional manner. Typically, areas between ~1 centimeter to 5 micrometers in width can be imaged. SEM can be used to image bacteria, viruses, tissues as well as larger samples like insects. Conventional SEM gives a magnification ranging from 20X to 30,000X and spatial resolution of 50 to 100 nanometers.
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Related Experiment Video

Updated: Jun 20, 2026

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
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Electron beam lithography on nonplanar and irregular surfaces.

Chenxu Zhu1, Huseyin Ekinci1, Aixi Pan1

  • 1Department of Electrical and Computer Engineering and Waterloo Institute for Nanotechnology (WIN), University of Waterloo, Waterloo, ON Canada.

Microsystems & Nanoengineering
|April 22, 2024
PubMed
Summary

Electron-beam lithography enables precise nanostructure fabrication on irregular surfaces. Novel techniques like spray coating and advanced instrumentation overcome previous limitations for enhanced nanofabrication.

Keywords:
electron beam lithographynanofabricationnonplanar and irregular surfacesplasma etching

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Surface Science

Background:

  • Electron-beam lithography (EBL) is crucial for creating nanoscale structures and devices.
  • Conventional EBL methods struggle with uniform resist coating on non-planar surfaces.
  • Optimizing EBL for irregular substrates requires advanced fabrication techniques.

Purpose of the Study:

  • To review current advancements in EBL for nanofabrication on irregular substrates.
  • To highlight unconventional methods overcoming challenges in resist coating and pattern transfer.
  • To explore the potential of EBL in diverse nanoscale applications on complex surfaces.

Main Methods:

  • Spray coating and evaporation for uniform electron-sensitive layers on irregular substrates.
  • Chemical bonding techniques like polymer brushes and self-assembled monolayers.
  • Utilizing thermal oxides as resists with altered etching rates post-exposure.
  • Integration of EBL with cryostages, evaporation, and metal deposition for low-temperature processing.
  • Employing ice as a positive resist for fabricating metallic nanopyramids on AFM tips.
  • Patterning metallic caps around carbon nanotubes and creating 3D nanostructures using anisole on ice.

Main Results:

  • Demonstrated uniform film deposition on irregular surfaces using spray and evaporation methods.
  • Successful application of chemical bonding for improved resist adhesion and patterning.
  • Showcased novel resist materials and processes, including thermal oxides and ice.
  • Integrated advanced instrumentation for enhanced sample manipulation and development.
  • Fabricated complex nanostructures like metallic nanopyramids, CNT caps, and 3D structures on challenging substrates.

Conclusions:

  • Advances in film coating, instrumentation, and pattern transfer significantly expand EBL capabilities on irregular substrates.
  • These developments enable precise nanofabrication for a wider range of applications.
  • EBL on irregular surfaces opens new avenues for creating sophisticated nanodevices and structures.