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Published on: October 23, 2018
An Atomically Resolved Schottky Barrier Height Approach for Bridging the Gap between Theory and Experiment at
Viacheslav Sorkin1, Hangbo Zhou1, Zhi Gen Yu1
1Agency for Science, Technology and Research (A*STAR), Institute of High Performance Computing (IHPC), 1 Fusionopolis Way, #16-16 Connexis, Singapore 138632, Republic of Singapore.
We developed a new method to precisely measure Schottky barrier height (SBH) variations at metal-semiconductor interfaces. This approach explains discrepancies in MoS2@Au heterojunctions, revealing defect-induced Ohmic contacts.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Surface Science
Background:
- Schottky barrier height (SBH) is crucial for metal-semiconductor contact performance.
- Existing methods struggle to explain experimental SBH variations in MoS2@metal heterojunctions.
- Discrepancies persist between theoretical predictions and experimental SBH measurements.
Purpose of the Study:
- To propose an atomically resolved method for calculating spatial SBH variations.
- To enable calculation of effective SBH values correlating with conductance measurements.
- To investigate SBH variations in MoS2@Au heterojunctions with grain boundaries.
Main Methods:
- Atom-specific partial density of states (PDOS) calculations.
- Application to MoS2@Au heterojunctions with conducting and semiconducting grain boundaries.
- Analysis of SBH variations at atomic scales.
Main Results:
- Significant SBH variations observed at atomic levels in defected heterojunctions.
- SBH approaching zero in areas with extended defects, indicating Ohmic contact.
- Effective SBH is intrinsically dependent on defect density and character.
Conclusions:
- The proposed method successfully explains experimental SBH variations and discrepancies in MoS2@metal systems.
- Demonstrated good agreement between calculated and experimental effective SBH values.
- Provides a pathway for understanding and manipulating SBHs in metal-semiconductor heterojunctions.
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