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Updated: Jun 27, 2025

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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
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Author Correction: Light and matter co-confined multi-photon lithography
Lingling Guan1, Chun Cao2,3, Xi Liu1
1Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China.
Nature Communications
|May 3, 2024
Summary
No abstract available in PubMed .
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