Droplet-Pen Writing of Ultra-Uniform Graphene Pattern for Multi-Spectral Applications

Artificial optical patterns bring wide benefits in applications like structural color display, photonic camouflage, and electromagnetic cloak. Their scalable coating on large-scale objects will greatly enrich the multimodal-interactive society. Here, a droplet-pen writing (DPW) method to directly write multi-spectral patterns of thin-film graphene is reported. By amphiphilicity regulations of 2D graphene nanosheets, ultra-uniform and ultrathin films can spontaneously form on droplet caps and pave to the substrate, thus inducing optical interference. This allows the on-surface patterning by pen writing of droplets. Specifically, drop-on-demand thin films are achieved with millimeter lateral size and uniformity up to 97% in subwavelength thickness (<100 nm), corresponding to an aspect ratio of over 30 000. The pixelated thin-film patterns of disks and lines in an 8-inch wafer scale are demonstrated, which enable low-emittance structural color paintings. Furthermore, the applications of these patterns for dual-band camouflage and infrared-to-visible encryption are investigated. This study highlights the potential of 2D material self-assembly in the large-scale preparation and multi-spectral application of thin film-based optical patterns.