Electrodeposition
Precipitation and Co-precipitation
Extraction: Advanced Methods
Preparation and Reactions of Thiols
EDTA: Auxiliary Complexing Reagents
Precipitation Titration: Endpoint Detection Methods
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Updated: Jun 26, 2025

Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution
Published on: March 20, 2019
Ying-Hsuan Wang1, Duraisamy Senthil Raja1, De-Hao Tsai1
1Department of Chemical Engineering, National Tsing Hua University, No. 101, Sec. 2, Kuang-Fu Rd., 300044, Hsinchu City, Taiwan.
This study presents a new method using gold nanoparticles to accurately measure thiolated additives in copper electroplating solutions, crucial for optimizing copper foil manufacturing. The technique enables precise control over the production of high-quality copper foil.
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