Related Experiment Video
Updated: Jul 31, 2026

08:54
Performing Spectroscopy on Plasmonic Nanoparticles with Transmission-Based Nomarski-Type Differential Interference Contrast Microscopy
Published on: June 5, 2019
7.6K
In-situ particle analysis with heterogeneous background: a machine learning approach.
Adeeb Ibne Alam1, Md Hafizur Rahman2, Akhter Zia1
1Department of Mechanical Engineering, University of Maine, Orono, ME, 04469, United States.
Scientific Reports
|May 8, 2024
Summary
This study introduces a novel AI-guided framework for accurate particle detection in complex manufacturing backgrounds. The system enhances precision and recall across diverse heterogeneous particle-substrate interfaces, improving process monitoring.
Area of Science:
- Manufacturing
- Materials Science
- Computer Vision
Background:
- Traditional particle detection methods struggle with heterogeneous particle-substrate (HPS) interfaces in manufacturing.
- Existing techniques like size analyzers and basic deep learning models are often inadequate for complex backgrounds.
Purpose of the Study:
- To develop a flexible, AI-guided framework for robust particle detection in complex manufacturing environments.
- To enhance the accuracy and reliability of particle identification on heterogeneous particle-substrate interfaces.
Main Methods:
- A four-step modular framework combining preprocessing, AI model selection, AI-guided detection, and postprocessing.
- Image enhancement and sharpening for preprocessing; Transfer Learning with MobileNet as a model selector for heterogeneity classification.
- Utilizing distinct YOLO models for particle identification based on classified heterogeneity, with domain knowledge for postprocessing to reduce false positives.
Main Results:
- The AI-guided framework demonstrates consistent precision and recall across various HPS conditions.
- The harmonic mean of precision and recall is comparable to individual AI model outcomes.
- The system effectively handles diverse particle and substrate properties and varying ambient lighting.
Conclusions:
- The developed framework offers a versatile solution for particle detection in complex manufacturing settings.
- This tool has significant potential for advancing in-situ process monitoring in diverse manufacturing operations.
- Applications include 3D printing, powder metallurgy, coatings, particle categorization, and semiconductor manufacturing.

