Controllable defects in monolayer graphene induced by hydrogen and argon plasma

Graphene has attracted wide attentions since its successfully exfoliation. Honeycombsp²carbon lattice and Dirac semi-metal band structure make graphene a promising material with excellent mechanical strength, thermal conductivity, and carrier mobility. However, the absence of intrinsic bandgap limits its application in semiconductor. Defects in graphene is supposed to modify its band structure and lead to an opened bandgap. Many methods have been demonstrated to introduce defects into graphene, such as chemical reaction, plasma, electron beam, and laser. However, the species of defects are mostly uncontrollable in most treatment processes. In this study, we report three kinds of defects can be controllably induced in graphene via hydrogen (H₂) and argon (Ar) plasma. With different parameter and feeding gas, hydrogenated graphene, graphene nanomesh and graphene with vacancies can be well obtained. The defect density can be precisely controlled by tuning plasma power and irradiation time. Morphological, spectroscopic, and electrical characterizations are performed to systematically investigate the defect evolution. Graphene nanomesh and graphene with vacancies show obvious difference for roughness and coverage, whereas the morphology of hydrogenated graphene remains similar with that of as-prepared graphene. For hydrogenated graphene, an opened bandgap of ∼20 meV is detected. For graphene nanomesh and graphene with vacancies, the semiconductive on/off behaviors are observed. We believe this work can provide more details of plasma-induced defects and assist the application of graphene in semiconductor industry.