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Deep-Level Structure of the Spin-Active Recombination Center in Dilute Nitrides
A C Ulibarri1, C T K Lew2, S Q Lim2
1Laboratoire de physique de la matière condensée, CNRS, Ecole Polytechnique, IP Paris, 91128 Palaiseau, France.
A gallium interstitial defect causes spin-dependent recombination in dilute nitrides. This study reveals its electronic structure, identifying multiple in-gap states near the valence band edge.
Area of Science:
- Semiconductor Physics
- Materials Science
- Quantum Chemistry
Background:
- Gallium interstitial defects are implicated in spin-dependent recombination in GaAsN dilute nitrides.
- These defects are associated with at least two in-gap electronic levels for (+/0) and (++/+) charge transitions.
Purpose of the Study:
- To investigate the in-gap electronic structure of GaAsN dilute nitrides using spin-sensitive techniques.
- To characterize the energy levels of gallium interstitial defects and their charge states.
Main Methods:
- Spin-sensitive photoinduced current transient spectroscopy (SPCTS) was employed.
- The study focused on a GaAs_{1-x}N_{x} alloy with x=0.021.
Main Results:
- The (+/0) charge state transition was located approximately 0.27 eV below the conduction band edge.
- Anomalous negative activation energy indicated the presence of additional in-gap states.
- The (++/+) state was found approximately 0.19 eV above the valence band edge, and a (+++/++) state approximately 25 meV above the valence band edge.
Conclusions:
- The electronic structure of the gallium interstitial defect in GaAsN is more complex than previously thought, involving multiple in-gap states.
- The findings provide a more detailed understanding of the defect responsible for spin-dependent recombination in these materials.
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