Updated: Jun 25, 2025

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates
Published on: July 2, 2012
Siddharth Doshi1,2, Dominik Ludescher3, Julian Karst3
1Department of Materials Science and Engineering, Stanford University, Stanford, CA 94305, USA.
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Researchers developed a direct write nano-patterning technique for conductive poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) using electron-beam induced solubility modulation, enabling high-resolution patterning for advanced electronic and photonic devices.
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