Radiographic Study of Transcrestal Sinus Floor Elevation Using Osseodensification Technique with Graft Material: A...

Area of Science:

• Dental Implantology
• Periodontology
• Oral Surgery

Background:

• Sinus floor elevation is crucial for maxillary posterior implants.
• Limited bone height in the posterior maxilla presents a challenge for implant placement.
• Transcrestal sinus floor elevation (tSFE) offers a less invasive approach.

Purpose of the Study:

• To evaluate implant success rates after tSFE using osseodensification (OD) and beta-tricalcium phosphate (β-TCP).
• To analyze bone height changes and implant stability following the procedure.
• To assess the predictability of the OD technique for sinus augmentation.

Main Methods:

• Pilot study involving 13 patients with residual bone height <8 mm.
• Transcrestal sinus floor elevation (tSFE) utilizing osseodensification (OD) technique.
• Augmentation with beta-tricalcium phosphate (β-TCP) and simultaneous implant placement.
• Radiographic analysis (CBCT) for bone height measurements at multiple time points.
• Clinical evaluation of implant success and stability.

Main Results:

• Achieved a 100% implant success rate after 12 months.
• Significant bone height increase of 6.65 ± 1.06 mm immediately after surgery.
• Observed a graft material contraction of 0.90 ± 0.49 mm after 12 months.
• No correlation found between bone height and primary implant stability.

Conclusions:

• Osseodensification (OD) combined with β-TCP for tSFE is a predictable technique for maxillary sinus floor elevation.
• Allows for simultaneous implant insertion with adequate stability, regardless of initial bone height limitations.
• This approach may enhance treatment options for patients with atrophic maxilla.