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High χ P2PFBEMA-b-P2VP Block Copolymers Forming 6-8 nm Domains for Semiconductor Lithography
Mengge Wang1, Tao Xue1, Han Miao1
1Key Laboratory of Specially Functional Polymeric Materials and Related Technology (Ministry of Education), School of Materials Science and Engineering, East China University of Science and Technology, Shanghai 200237, China.
ACS Applied Materials & Interfaces
|June 5, 2024
Summary
This study showcases a high chi-low N block copolymer (BCP) for advanced nanomanufacturing. The material achieves highly ordered nanostructures down to 6 nm, demonstrating potential for directed self-assembly lithography.
Area of Science:
- Materials Science
- Polymer Chemistry
- Nanotechnology
Background:
- Block copolymers (BCPs) are crucial for nanomanufacturing due to their self-assembly properties.
- Achieving high domain purity and small feature sizes in BCPs remains a challenge for advanced applications.
Purpose of the Study:
- To evaluate the potential of a specific high chi-low N BCP, poly[2-(perfluorobutyl) ethyl methacrylate]-block-poly(2-vinylpyridine) (P2PFBEMA-b-P2VP), for next-generation nanomanufacturing.
- To investigate the self-assembly behavior and optimize parameters for creating highly ordered nanostructures.
Main Methods:
- Combined molecular dynamics simulations and experimental characterization.
- Utilized transmission electron microscopy (TEM) to analyze BCP solutions and thin films.
- Manipulated solvent, substrate, and annealing conditions to control nanostructure orientation.
- Employed directed self-assembly (DSA) with topographical templates.
Main Results:
- Calculated a high chi value of 0.4 at 150 °C for P2PFBEMA-b-P2VP, exceeding similar BCPs.
- Achieved highly ordered nanostructures with periods from 19.0 nm down to 12.1 nm and feature sizes as small as 6 nm.
- Demonstrated control over cylindrical nanostructure orientation (vertical or parallel).
- Produced nearly defect-free DSA lines with 8 nm resolution using topographical templates.
Conclusions:
- The high chi-low N BCP P2PFBEMA-b-P2VP is a promising material for advanced nanomanufacturing.
- Preformed micelles in solution facilitate thin-film self-assembly.
- Optimized processing conditions enable precise control over nanostructure formation and orientation.
- The material shows significant potential for practical application in DSA lithography technology.
