Reaction-diffusion study of electron-beam-induced contamination growth

Erich Müller1, Katharina Adrion1, Milena Hugenschmidt2

  • 1Laboratory for Electron Microscopy, Karlsruhe Institute of Technology (KIT), Engesserstr. 7 76131 Karlsruhe, Germany.

Ultramicroscopy
|June 8, 2024
PubMed
Summary

A new reaction-diffusion model explains electron beam-induced contamination growth on surfaces. This model quantifies contaminant flow and polymerization, aiding in reducing unwanted deposition during electron microscopy.