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Autofocusing of laser lithography through the crosshair projection method
Applied Optics
|June 10, 2024
Summary
This study introduces a novel autofocusing method using crosshair projection for laser direct writing lithography. This technique enhances image information, enabling precise focal plane detection and accurate sample focusing.
Area of Science:
- Optics and Photonics
- Materials Science
- Nanotechnology
Background:
- Laser direct writing lithography lacks surface image information, complicating focal plane determination.
- Accurate focusing is critical for high-resolution patterning in laser lithography.
Purpose of the Study:
- To propose and validate an autofocusing method using crosshair projection for laser direct writing lithography.
- To improve the focusing environment and accuracy in laser lithography systems.
Main Methods:
- A crosshair projection method is integrated into the lighting path, imaging onto the sample surface.
- A new focusing curve division is presented, utilizing perpendicular features from the crosshair projection.
- Autofocusing process designed based on the new division to identify the focusing zone and filter out flat zone interference.
Main Results:
- The crosshair projection provides necessary image information for focusing.
- The new focusing curve division effectively distinguishes focusing and flat zones.
- Experimental results demonstrate an autofocusing accuracy of approximately 0.15 µm.
Conclusions:
- The proposed crosshair projection autofocusing method offers a robust solution for accurate focusing in laser direct writing lithography.
- This method enhances image information and simplifies the focusing process, improving overall lithography performance.
