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Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

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Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
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Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station
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Angularly offset multiline dispersive optical phased array enabling large field of view and plateau envelope.

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    We developed an angularly offset multiline optical phased array (OPA) for efficient beam scanning. This silicon nitride device achieves a wide 152° field of view with stable intensity, enhancing optical system performance.

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    Area of Science:

    • Photonics and Optical Engineering
    • Integrated Optics
    • Semiconductor Devices

    Background:

    • Optical phased arrays (OPAs) are crucial for beam steering applications.
    • Existing OPAs face limitations in field of view (FOV) and intensity stability.
    • Silicon nitride photonics offers advantages for integrated optical devices.

    Purpose of the Study:

    • To propose and demonstrate a novel angularly offset multiline (AOML) dispersive silicon nitride OPA.
    • To achieve efficient line beam scanning with an expanded FOV and stable intensity envelope.
    • To integrate multiline OPAs using thermo-optic switches for enhanced performance.

    Main Methods:

    • Fabrication of a silicon nitride OPA with integrated multiline units and a 45° angular offset.
    • Utilizing thermo-optic switches based on multimode interference couplers for seamless integration.
    • Implementing oblique polishing techniques for angled facet fabrication.
    • Engineering delay lines with adjustable lengths for passive wavelength-tunable beam scanning.

    Main Results:

    • Demonstrated efficient beam scanning across a wide FOV of 152° via wavelength tuning (1530-1600 nm).
    • Achieved a plateau envelope with reduced peak intensity fluctuation (2.8 dB) across the large FOV.
    • Measured a dispersive scanning efficiency of 0.97°/nm.
    • Successfully switched between multiline OPAs for continuous scanning.

    Conclusions:

    • The AOML OPA design effectively expands the FOV and improves intensity stability for beam scanning.
    • Silicon nitride is a suitable material for fabricating advanced OPAs with integrated functionalities.
    • The demonstrated OPA technology holds promise for applications requiring wide-angle, stable optical beam steering.