Optimization of Magnetic Tunnel Junction Structure through Component Analysis and Deposition Parameters Adjustment

Crina Ghemes1, Mihai Tibu1, Oana-Georgiana Dragos-Pinzaru1

  • 1National Institute of Research and Development for Technical Physics, 700050 Iasi, Romania.

PubMed
Summary

Optimizing thin film deposition parameters significantly enhances magnetic tunnel junction (MTJ) performance. Precise control over layer properties improved tunnel magnetoresistance (TMR) by an average of 10%.