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Updated: Jun 15, 2026

Atomically Traceable Nanostructure Fabrication
Published on: July 17, 2015
Nanoscale, surface-confined phase separation by electron beam induced oxidation
Sven Barth1,2, Fabrizio Porrati1, Daniel Knez3
1Institute of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, 60323 Frankfurt am Main, Germany. barth@physik.uni-frankfurt.de.
Abstract:
Electron-assisted oxidation of Co-Si-based focused electron beam induced deposition (FEBID) materials is shown to form a 2-4 nm metal oxide surface layer on top of an electrically insulating silicon oxide layer less than 10 nm thick. Differences between thermal and electron-induced oxidation on the resulting microstructure are illustrated.
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