Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Atherosclerotic middle cerebral artery stenosis: adjacent arterial geometry, hemodynamics and plaque features.

Japanese journal of radiology·2026
Same author

Effects of different intervention modalities combined with exercise in patients with insomnia: a systematic review and network meta-analysis.

Frontiers in public health·2026
Same author

Multi-trajectory patterns of ADL, cognition, and depression with fall risk: evidence from a longitudinal study in China.

BMC geriatrics·2026
Same author

Avian Pathogenic Escherichia coli T6SS Effector Protein Hcp2 Induces Mitochondrial Dysfunction and Activates Mitophagy in Chicken Tracheal Mucosal Epithelial Cells.

Transboundary and emerging diseases·2026
Same author

PmD479 is an Unutilized Gene for Powdery Mildew Resistance in Common Wheat.

Plant biotechnology journal·2026
Same author

Predicting protein-protein interaction sites based on dynamic perception mechanism within a hierarchical E(n)-equivariant graph.

Briefings in bioinformatics·2026

Related Experiment Video

Updated: Jun 22, 2025

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices
10:18

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

Published on: January 27, 2017

14.4K

Mask structure optimization for beyond EUV lithography.

Ziqi Li, Lisong Dong, Ma Xu

    Optics Letters
    |July 1, 2024
    PubMed
    Summary
    This summary is machine-generated.

    Beyond extreme ultraviolet (BEUV) lithography uses a 6 nm wavelength for integrated circuit manufacturing. This study optimizes mask structures to enhance BEUV imaging quality, improving pattern shrinking capabilities.

    More Related Videos

    Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices
    06:21

    Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

    Published on: January 25, 2021

    2.9K
    Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
    07:47

    Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

    Published on: February 12, 2017

    7.2K

    Related Experiment Videos

    Last Updated: Jun 22, 2025

    Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices
    10:18

    Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

    Published on: January 27, 2017

    14.4K
    Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices
    06:21

    Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

    Published on: January 25, 2021

    2.9K
    Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
    07:47

    Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

    Published on: February 12, 2017

    7.2K

    Area of Science:

    • Semiconductor manufacturing
    • Advanced lithography techniques
    • Optical physics

    Background:

    • Beyond extreme ultraviolet (BEUV) lithography is a promising future technology for integrated circuit (IC) manufacturing, enabling continued pattern shrinking.
    • Current mask structures require optimization to maximize imaging quality in BEUV lithography systems.
    • Accurate modeling of mask diffraction near-field (DNF) is crucial for predicting lithography performance.

    Purpose of the Study:

    • To propose and validate an optimization method for mask structures to enhance imaging quality in BEUV lithography.
    • To improve the reflection coefficient of mask multilayers for better light manipulation.
    • To develop an inverse design approach for mask absorber structures to achieve superior lithographic results.

    Main Methods:

    • Optimization of mask multilayer structures to maximize reflection coefficient.
    • Establishment of a mask diffraction near-field (DNF) model using the Born series algorithm.
    • Inverse design of mask absorber structures employing the particle swarm optimization (PSO) algorithm.

    Main Results:

    • Significant improvements in BEUV lithography imaging quality were achieved through the proposed optimization methods.
    • The optimized mask structures demonstrated enhanced performance in simulations.
    • The developed workflow proved effective for improving imaging in advanced lithography.

    Conclusions:

    • The proposed mask structure optimization method significantly enhances imaging quality in BEUV lithography.
    • The workflow is applicable to EUV (extreme ultraviolet) and soft X-ray imaging applications.
    • This research contributes to the advancement of next-generation semiconductor manufacturing techniques.