Review of Anodic Tantalum Oxide Nanostructures: From Morphological Design to Emerging Applications

Anodization of transition metals, particularly the valve metals (V, W, Ti, Ta, Hf, Nb, and Zr) and their alloys, has emerged as a powerful tool for controlling the morphology, purity, and thickness of oxide nanostructures. The present review is focused on the advances in the synthesis of micro/nanostructures of anodic tantalum oxides (ATO) in inorganic, organic, and mixed inorganic-organic type electrolytes with critically highlighting anodization parameters, such as applied voltage, current, time, and electrolyte temperature. Particularly, the growth of ATO nanostructures in fluoride containing electrolytes and their applications are briefly covered. The details of the current- or voltage-time transient and its relation to the growth of the anodic oxide films are presented systematically. The main discussion revolves around the incorporation of various electrolyte species into the surface of ATO structures and its effects on their physicochemical properties. The latest progress in understanding the growth mechanism of nanoporous/nanotubular ATO structures is outlined. Additionally, the impact of annealing temperature (ranging from 400-1000 °C) and atmosphere on the crystalline structure, morphology, impurity content, and physical properties of the ATOs is briefly described. The common modification methods, such as decorating with other transition metal/metal oxide, heteroatom doping, or generating defects in the ATO structures, are discussed. Besides, the review also covers the most promising applications of these materials in the fields of capacitors, supercapacitors, memristive devices, corrosion protection, photocatalysis, photoelectrochemical (PEC) water splitting, and biomaterials. Finally, future research directions for designing ATO-based nanomaterials and their utilities are indicated.