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Updated: Jun 5, 2026

Fabrication of Uniform Nanoscale Cavities via Silicon Direct Wafer Bonding
Published on: January 9, 2014
Double-Sided Bonding Process Enables X-ray Flat Panel Detectors
Hui Zhang1,2, Shujie Tie3, Jiajiu Ye1
1Institute of Solid-State Physics, Hefei Institutes of Physical Science, Chinese Academy of Science, Hefei 230031, China.
Metal halide perovskites offer advanced X-ray detection capabilities. A new double-sided bonding method enables large-area perovskite X-ray detector fabrication, overcoming integration challenges.
Area of Science:
- Materials Science
- Detector Physics
- Solid-State Electronics
Background:
- Metal halide perovskites exhibit promising photoelectric properties for X-ray detection.
- Current challenges include integrating perovskites into large-area pixelated sensors for direct X-ray imaging.
Purpose of the Study:
- To develop a scalable fabrication strategy for large-area perovskite X-ray detector arrays.
- To demonstrate the performance of delta-Cesium Lead Iodide (δ-CsPbI3) in direct X-ray detection.
Main Methods:
- A double-sided bonding process utilizing van der Waals force was employed.
- A wet film deposition technique bonded a thin-film transistor substrate to a δ-CsPbI3 wafer.
- Characterization of the freestanding polycrystalline δ-CsPbI3 wafer's X-ray detection performance.
Main Results:
- The fabricated device facilitates area-array imaging for X-ray detection.
- The δ-CsPbI3 wafer achieved an ultralow detection limit of 3.46 nGyair s-1 under 50 kVP X-ray irradiation.
- Stable signal output was maintained with a signal current drift of 3.5 × 10-5 pA cm-1 s-1 V-1 under 234.9 mGyair accumulated dose.
Conclusions:
- The proposed double-sided bonding strategy enables the fabrication of large-area perovskite X-ray detector arrays.
- This method offers a novel approach for the industrial production of perovskite-based X-ray flat panel detectors.
- δ-CsPbI3 demonstrates excellent stability and sensitivity, paving the way for next-generation X-ray imaging.
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