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Updated: Jun 21, 2026

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Published on: December 11, 2014
Electron beam lithography of GeTe through polymorphic phase transformation
Hu Zhang1,2,3, Meng Li4, Shao-Bo Mi1
1Ji Hua Laboratory, Foshan 528200, China. mi_jhlab@163.com.
Abstract:
We report two previously undiscovered phases of GeTe including the sphalerite (c-) phase and the hexagonal (h-) phase with interlayer van der Waals gaps. A polymorphic phase transformation from rhombohedral α-GeTe to c- and h-GeTe at near room temperature is first realized via electron beam irradiation. Their underlying thermodynamics and kinetics are illustrated using the in situ heating experiments and molecular dynamics simulations. Density-functional theory calculations indicate that c-GeTe exhibits typical metallic behavior and h-GeTe is a narrow-gap semiconductor with a strong spin-orbital coupling effect. Our findings shed light on a strategy for designing GeTe-based quantum devices compromising nanopillars and heterostructures via an atomic-scale electron beam lithography technique.
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